{"id":430,"date":"2024-12-30T05:56:47","date_gmt":"2024-12-30T05:56:47","guid":{"rendered":"https:\/\/sh-xr.com\/?p=430"},"modified":"2025-01-07T03:49:57","modified_gmt":"2025-01-07T03:49:57","slug":"lithography-training","status":"publish","type":"post","link":"https:\/\/sh-xr.com\/?p=430","title":{"rendered":"Lithography training"},"content":{"rendered":"\t\t<div data-elementor-type=\"wp-post\" data-elementor-id=\"430\" class=\"elementor elementor-430\" data-elementor-post-type=\"post\">\n\t\t\t\t<div class=\"elementor-element elementor-element-9b1b41b e-flex e-con-boxed e-con e-parent\" data-id=\"9b1b41b\" data-element_type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-16ff179 elementor-widget elementor-widget-image\" data-id=\"16ff179\" data-element_type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" 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data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>Introduction to photolithography equipment, material loading, setting parameters of photoresist coating and developing machine, placing mask, setting parameters of photolithography machine, surface preparation, photoresist coating, soft baking, silicon wafer edge exposure, leveling and alignment, photolithography machine principle and step-by-step exposure, post-baking, developing, hard baking (hard film), and post-development inspection<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bbe5344 elementor-widget elementor-widget-image-carousel\" data-id=\"bbe5344\" data-element_type=\"widget\" data-settings=\"{&quot;slides_to_show&quot;:&quot;3&quot;,&quot;slides_to_scroll&quot;:&quot;1&quot;,&quot;navigation&quot;:&quot;none&quot;,&quot;infinite&quot;:&quot;yes&quot;,&quot;speed&quot;:500}\" 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mask, setting parameters of photolithography machine, surface preparation, photoresist coating, soft baking, silicon wafer edge exposure, leveling and alignment, photolithography machine principle and step-by-step exposure, post-baking, developing, hard baking (hard film), and post-development inspection 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